西安交通大学电子与信息学部,西安,710049
网络首发:2022-02-10,
纸质出版:2022
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党鑫, 杨向红, 孙岳, 等. GaAs光导开关电极制备工艺及性能测试[J]. 西安交通大学学报, 2022,56(2):184-190.
Preparation Technology and Performance Test of GaAs Photoconductive Semiconductor Switch Electrodes[J]. 2022, 56(2): 184-190.
党鑫, 杨向红, 孙岳, 等. GaAs光导开关电极制备工艺及性能测试[J]. 西安交通大学学报, 2022,56(2):184-190. DOI: 10.7652/xjtuxb202202019.
Preparation Technology and Performance Test of GaAs Photoconductive Semiconductor Switch Electrodes[J]. 2022, 56(2): 184-190. DOI: 10.7652/xjtuxb202202019.
为了解决目前GaAs光导开关成品率低、稳定性差和可靠性低等问题
提出了GaAs光导开关的关键电极制备工艺解决方案。该方案首先以半绝缘GaAs材料作为衬底
利用电子束蒸镀机在GaAs衬底上沉积Ni/Ge/Au/Ni/Au金属复合层作为光导开关电极
并对电极进行快速退火使其与GaAs衬底形成欧姆接触; 然后
为了隔绝光导开关与外界环境
在GaAs衬底上沉积氮化硅作为钝化保护层; 最后
通过在欧姆接触电极上外延场板的工艺
制备出电极间距为4 mm的异面GaAs光导开关。对所制备的GaAs光导开关的测试结果表明:在400 ℃退火条件下
电极的接触电阻率最低可达到0.019 5 Ω•cm
2
; 采用50 Ω单脉冲形成线
在工作频率为1 kHz、偏置电压为22 kV时
光导开关的输出电压脉冲为10 kV
脉冲上升时间为亚ns量级。采用该制备方法制备的GaAs光导开关的成品率高达约98%
可稳定工作上万次。
A key electrode preparation process solution of GaAs photoconductive semiconductor switch is proposed to solve the current problems of low yield
poor stability and low reliability of GaAs photoconductive semiconductor switches. In this scheme
the semi-insulating GaAs material is firstly used as substrate
and the Ni/Ge/Au/Ni/Au metal composite layer is deposited on GaAs substrate by electron beam evaporation machine as electrode of GaAs photoconductive semiconductor switch
and then the electrode is annealed quickly to form ohmic contact with the GaAs substrate; then
in order to isolate the photoconductive semiconductor switch from the external environment
silicon nitride is deposit
ed on the GaAs substrate as a passivation protective layer; finally
a GaAs photoconductive semiconductor switch with 4 mm gap between two bilateral electrodes is fabricated by epitaxial field plate on ohmic contact electrode. Test results of the GaAs photoconductive semiconductor switch show that the minimum specific contact resistivity of the electrode can reach 0.019 5 Ω•cm
2
when annealed at 400 ℃; When the single pulse forming line of 50 Ω is adopted
the operating frequency is 1 kHz and the bias voltage is 22 kV
the output voltage pulse of photoconductive semiconductor switch is 10 kV and the pulse rise time is sub ns. The yield of GaAs photoconductive semiconductor switch prepared by this preparation method is about 98%
and it can work stably for tens of thousands of times.
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