氩等离子体技术降解玉米表面毒死蜱的研究

谢瑾琢; 刘红霞; 冯鑫鑫; 马辛

doi:10.7652/xjtuxb202003014

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氩等离子体技术降解玉米表面毒死蜱的研究

更新时间：2025-07-09

- 氩等离子体技术降解玉米表面毒死蜱的研究
- Degradation of Chlorpyrifos on Mai-e Surface by Argon Plasma
- 西安交通大学学报 2020年54卷第3期页码：113-118+178
- 作者机构：
  
  西安交通大学环境工程系,西安,710049
- 作者简介：
- 基金信息：
  
  : 2019-05-30。作者简介: 谢瑾琢(1996—),女,硕士生;刘红霞(通信作者),女,副教授,博士生导师。基金项目: 国家自然科学基金资助项目(31871889);陕西省自然科学基础研究计划资助项目(2017JM5067);中央高校基本科研业务费专项资金资助项目(Z201503103)
- DOI：10.7652/xjtuxb202003014
  中图分类号： X503.231
- 网络首发：2020-03-10，
  
  纸质出版：2020
- 稿件说明：
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谢瑾琢, 刘红霞, 冯鑫鑫, 等. 氩等离子体技术降解玉米表面毒死蜱的研究[J]. 西安交通大学学报, 2020,54(3):113-118+178.

Degradation of Chlorpyrifos on Mai-e Surface by Argon Plasma[J]. 2020, 54(3): 113-118+178.
谢瑾琢, 刘红霞, 冯鑫鑫, 等. 氩等离子体技术降解玉米表面毒死蜱的研究[J]. 西安交通大学学报, 2020,54(3):113-118+178. DOI： 10.7652/xjtuxb202003014.

Degradation of Chlorpyrifos on Mai-e Surface by Argon Plasma[J]. 2020, 54(3): 113-118+178. DOI： 10.7652/xjtuxb202003014.

摘要

为克服传统农药降解方法效率低、能耗高、二次污染等问题

在自行设计的介质阻挡放电反应器中

以氩为放电气体、以玉米表面残留的有机磷农药毒死蜱为实验对象

改变放电功率、放电时间、放电间隙、毒死蜱初始质量浓度和氩气流量等放电参数

对毒死蜱降解效果及降解后玉米表面特征和营养成分进行了分析。实验结果表明:当毒死蜱初始质量浓度为20 mg/L时

在放电功率为35 W、放电时间为60 s、放电间隙为6 mm、氩气流量为0.25 L/min条件下

玉米表面毒死蜱降解率可达87%

达到农药残留量的国标要求。农药降解过程中

氩等离子体在玉米表面产生轻微刻蚀

同时促使玉米水分含量降低

有利于玉米储存。处理后玉米的重要营养成分维生素B

质量分数并无显著变化

淀粉的质量分数降低

脂肪酸的质量分数增加

但并不影响玉米品质和贮藏价值。因此

氩等离子体技术是一种高效、快速、安全、绿色无污染的农药残留降解技术

具有进一步工业化应用的潜力。

Abstract

To overcome the shortcomings of the conventional methods for pesticides degradation

such as low efficiency

high energy consumption

and secondary pollution

a self-designed dielectric barrier discharge reactor was used to degrade pesticides on mai-e

and chlorpyrifos was chosen as the research object. The effects of chlorpyrifos degradation

as well as the surface characteristics and the nutrients of mai-e

after degradation were studied by changing the discharge parameters(discharge power

treatment time

discharge gap)

initial concentration of chlorpyrifos

and argon flux. The results showed that at discharge power of 35 W

treatment time of 60 s

discharge gap of 6 mm and argon flux of 0.25 L/min

87% of chlorpyrifos with initial concentration of 20 mg/L could be successfully degraded

which met the national standard about pesticide residues. In the process of pesticides degradation

argon plasma treatment attributed to slight etching on the surface of mai-e

which could reduce t

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Keywords

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