微压印中抗蚀剂填充行为研究

李世泽; 魏正英; 杜军; 唐一平

doi:10.7652/xjtuxb201309021

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微压印中抗蚀剂填充行为研究

更新时间：2025-07-09

- 微压印中抗蚀剂填充行为研究
- Resist Filling Behavior in Microimprint
- 西安交通大学学报 2013年47卷第9期页码：126-133
- 作者机构：
  
  西安交通大学机械制造系统国家重点实验室,西安,710049
- 作者简介：
- 基金信息：
  
  : 2012-12-11。作者简介: 李世泽(1988—),男,硕士生;魏正英(通信作者),女,教授。基金项目: 国家自然科学基金资助项目(50975227)
- DOI：10.7652/xjtuxb201309021
  中图分类号： TB22
- 网络首发：2013-09-10，
  
  纸质出版：2013
- 稿件说明：
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李世泽, 魏正英, 杜军, 等. 微压印中抗蚀剂填充行为研究[J]. 西安交通大学学报, 2013,47(9):126-133.

Resist Filling Behavior in Microimprint[J]. 2013, 47(9): 126-133.
李世泽, 魏正英, 杜军, 等. 微压印中抗蚀剂填充行为研究[J]. 西安交通大学学报, 2013,47(9):126-133. DOI： 10.7652/xjtuxb201309021.

Resist Filling Behavior in Microimprint[J]. 2013, 47(9): 126-133. DOI： 10.7652/xjtuxb201309021.

摘要

为了提高微压印的质量

改进工艺参数优化模具结构

对微压印抗蚀剂的填充行为进行了数值计算和可视化实验研究。实验在三维离焦数字粒子图像测速系统中进行

由此提取了抗蚀剂中的荧光示踪粒子的坐标

通过时间解析算法获得了示踪粒子的三维粒子场

利用粒子跟踪测试技术获得了示踪粒子的速度场。数值模拟中采用了计算流体动力学软件

同时考虑了表面张力和接触角等因素

并根据模具特征划分了不同的压印区域

以分析、预测压印模型中的抗蚀剂填充行为。研究结果显示: 数值模拟与实验结果吻合较好

抗蚀剂速度最大值在模具尖角与支撑基板之间

抗蚀剂速度水平方向上的实验最大误差为6.6%

竖直方向上的最大误差为9.6%; 模具侧壁下方粒子运动轨迹的演化方向决定着抗蚀剂的体积转移方向和最终的填充形貌。该结果可为深入研究微压印中抗蚀剂流动提供参考。

Abstract

In order to improve microimprint quality and process parameters

and to optimize module structure

numerical simulations and visualization experiments were conducted to study the resist filling behavior of microimprint lithography. A 3D defocusing digital particle image velocimetry system was established to do visualization research and the spatial coordinates of the fluorescent tracer particles in the resist were extracted from images. The 3D particle field inside the resist was obtained by the time-resolved algorithm. The velocity field was derived from the particle spatial position using particle tracking velocimetry. A numerical model based on the computational fluid dynamics was built to examine the resist filling behavior with surface tension and contact angle considered. The stamping area was divided into different parts according to the mold features. The numerical simulation results agree well with the experimental data. The results show that the experimental error of the resist velocity fields in the horizontal direction is less than 6.6%

while the experimental error in the vertical direction is less than 9.6%. The maximum velocity of the resist always lies in the sector between the stamp corner and the substrate. The evolution directions of motion trajectories of particles under the stamp sidewall determine the filling morphology and the direction of transferred volume of the resist. The results of this study may provide references to the further research on the resist flow in microimprint.

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references

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