1. 西安交通大学环境科学与工程系,西安,710049
2. 西安交通大学动力工程多相流国家重点实验室,西安,710049
网络首发:2010-09-10,
纸质出版:2010
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刘红霞 1, 2, 陈杰瑢 1. 远程氩等离子体表面灭菌研究[J]. 西安交通大学学报, 2010,44(9):109-114.
Study on Surface Sterilization of Remote Argon Plasma[J]. 2010, 44(9): 109-114.
研究了射频放电远程氩等离子体对材料表面金黄色葡萄球菌的灭活效果及动力学
并结合等离子体场中活性粒子的分布状态
分析了灭菌机理.结果表明:远程氩等离子体的灭菌效果强烈依赖于等离子体处理条件
且随处理时间的延长
不同放电距离处的灭菌速率均分为3段逐渐减慢
并在放电功率100 W、放电时间240 s、氩气流量20 cm
3
/min、真空度22 Pa的条件下
在距放电中心0~30 cm范围内可实现对金黄色葡萄球菌的有效灭活(灭菌率≥99.9%); 在高放电功率下且氩气电离充分时
带电粒子(电子、离子)对菌体表面强烈的刻蚀作用是氩等离子体灭活金黄色葡萄球菌的主要原因
自由基对细菌的杀灭力小于带电粒子
而低放电功率下的灭菌则是由氩等离子体场中紫外光的作用所致.
The germicidal effect(GE)and kinetics of Staphylococcus aureus by remote argon plasma are investigated
and the inactivation mechanism combining with the distribution of reactive species in the whole plasma field is discussed. The results show that the germicidal effect strongly depends on the experimental conditions
and with exposure time increasing
the kill rate slowers with three different segments. The effective inactivation appears within the distance of 0-30 cm(GE is no less that 99.9%)with the process parameters as follows: RF power of 100 W
time of 240 s
gas flow of 20 cm
3
/min
and pressure of 22 Pa. When the ionization degree of argon gas is sufficient under high power
the effectiveness of the remote argon plasma sterilization is believed to be attributed to the intense etching action on cell materials
which is initiated by discharge particles(electrons and
Ar ions)
the bombardment by free radicals is subsidiary. UV radiation in the plasma is the primary reason of bacterial inactivation under lower power.
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