A UV-based nano imprint lithography(NIL)method is developed to fabricate thin film with controlled TiO

2

nanocrystal island array on the transparent conductive glass substrate for dye sensitive solar cells(DSSC). The UV curable TiO

2

sol is prepared to form TiO

2

thin film with 3 μm critical dimension TiO

2

nanocrystal island array by mixing TiO

2

powder

dispersant

emulsifier

alcohol and UV-curable resin. Ultimately

TiO

2

thin film with orderly island array is fabricated by the pressure holding replica optimized technique. The thin film is further heated up to 600 ℃ to wipe off the adulterant like UV-curable resist and cooled down to 450 ℃

then the TiO

2

nanocrystal island on the thin film is changed to the anatase TiO

2

. The experimental results show that DSSC equipped with TiO

2

nanocrystal island array is endowed with conversion efficiency over 2.7% under AM 1.5 illumination(0.1 W/cm

2

)

which infers that the NIL method can be employed to fabricate highly stable DSSC with quasi-solid-state or solid state electrolyte.