针对深亚微米围栅金属氧化物半导体场效应管(MOSFET)的短沟道效应随沟道长度减小而愈加明显
以及移动电荷在器件强反型区对表面势影响显著的问题
提出了一种全耗尽围栅MOSFET二维模型.同时考虑耗尽电荷和自由电荷的影响
结合沟道与氧化层界面处的边界条件
求解一维泊松方程
得到一维电势分布模型
然后结合器件源漏处的边界条件求解拉普拉斯方程
最终得到全耗尽围栅MOSFET精确的二维表面势模型
并在此基础上得到了阈值电压、亚阈值斜率等电学参数的解析模型.利用Sentaurus软件对解析模型进行了验证
结果表明:该模型克服了本征模型在重掺杂情况下失效和仅考虑耗尽电荷的模型在强反型区失效的缺点
在不同沟道掺杂情况下从亚阈值区到强反型区都适用;与原有模型相比
该阈值电压模型的误差减小了45.5%.
A two-dimensional model for fully depleted cylindrical/surrounding gate MOSFET is proposed to address the issues that the short channel effects(SCEs)of deep submicron MOSFET are more obvious with the decrease of channel length
and that mobile charge has a significant impact on surface potential when the device is working in strong-inversion regions. Taking account of the effects of both depletion charge and free charge
an one-dimensional potential model is obtained by solving one-dimensional Poisson's equation with the boundary conditions at the interface of the channel and the oxide layer. Then the Laplace equation is solved by using the boundary conditions at the source and drain regions to construct the accurate two-dimensional surface potential model. Then analytical models for both the threshold voltage and the subthreshold slope are derived. These models are verified by device simulation software Sentaurus. The results show that the proposed model is applicable from the sub-threshold region to the strong-inversion region in different channel doping conditions
and overcomes the shortcomings that the intrinsic model is not valid under the heavy doping conditions and the model based on only depletion charge fails in the strong-inversion region.Comparisons with existing models show that the error of threshold voltage reduces by 45.5%.
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