Surface Potential Measurement of Dielectric Materials Using Metal Probe in Secondary Electron Emission Process

doi:10.7652/xjtuxb201901022

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Surface Potential Measurement of Dielectric Materials Using Metal Probe in Secondary Electron Emission Process

更新时间：2025-07-09

- Surface Potential Measurement of Dielectric Materials Using Metal Probe in Secondary Electron Emission Process
- Vol. 53, Issue 1, Pages: 163-168(2019)
- 作者机构：
  
  西安交通大学电子物理与器件教育部重点实验室,西安,710049
- 作者简介：
- 基金信息：
- DOI：10.7652/xjtuxb201901022
  CLC： O462;TN16
- Online First：10 January 2019，
  
  Published：2019
- 稿件说明：
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Surface Potential Measurement of Dielectric Materials Using Metal Probe in Secondary Electron Emission Process[J]. 2019, 53(1): 163-168.
DOI：

Surface Potential Measurement of Dielectric Materials Using Metal Probe in Secondary Electron Emission Process[J]. 2019, 53(1): 163-168. DOI： 10.7652/xjtuxb201901022.

摘要

为研究介质材料二次电子发射过程中表面电位的测量手段及相关规律

以拒斥场会影响二次电子出射为基础

提出了能够原位测量介质材料表面电位的探针法。首先

利用专业电磁仿真软件对探针法原理进行了研究

计算了探针附近电位分布和探针偏压对二次电子发射系数的影响曲线

此曲线拐点处对应的探针偏压即为样品的表面电位; 其次

用铜样品进行了实验研究

验证了探针法测量样品表面电位的可行性; 最后

将探针法应用于介质材料聚甲基丙烯酸甲酯(PMMA)

对其表面电位进行了实验测量和研究。结果表明:栅网偏压和入射电子能量对PMMA表面电位有直接的影响

PMMA表面电位总是高于栅网偏压

两者呈线性关系; 随着入射电子能量的增加

PMMA表面电位呈现先升高后下降的趋势。实验结果与理论分析相一致

验证了探针法测量介质材料表面电位的可行性。该方法操作简便、成本低廉

而且实现了原位在线测量

减小了实验中的不稳定性

对介质材料二次电子发射机理的研究有一定的参考价值。

Abstract

To study measurement methods and relevant rules of the surface potential in the process of secondary electron emission of dielectric materials

this paper proposes a new in situ online method for the measurement of the surface potential of insulating samples based on the fact that electric field will affect the secondary electron emission

and we call it probe method. Firstly

the principle of the probe method is studied by using a professional electromagnetic simulation software. The potential distribution near the probe and the influence of probe bias on the secondary electron emission coefficient are calculated. Then the probe bias at the knee of the curve is considered as the surface potential of the dielectric sample. Secondly

experiments are carried out with copper samples

and the feasibility of the probe method for measuring the surface potential of the samples is verified. Finally

the probe method is applied to the dielectric material polymethyl methacrylate(PMMA)to measure its surface potential. The results show that the grid bias voltage and the incident electron energy have direct influences on the surface potential of PMMA. The surface potential of PMMA is higher than the grid bias and they are in a linear relationship. With the increase of the incident electron energy

the surface potential of PMMA increases first and then decreases. This is consistent with the theoretical analysis

which further validates the feasibility of the probe method in measuring the surface potential of dielectric materials. This method is easy to operate and low in cost

and can realize in situ online measurement to reduce the instability in the experiment

therefore it is applicable to the study of the secondary electron emission of dielectric materials.

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references

SHIH A J, YATER J, HOR C, et al. Secondary electron emission [J]. Applied Surface Science, 1997, 111(2): 251-258.

LIN Y, JOY D C. A new examination of secondary electron yield data [J]. Surface Interface Analysis, 2010, 37(11): 895-900.

LI Y D, YANG W J, ZHANG N, et al. A combined phenomenological model for secondary electron emission [J]. Acta Physica Sinica, 2013, 62(7): 255-313.

虞阳烨, 曹猛, 张海波. 金属二次电子发射能谱的表面吸附势垒模型 [J]. 西安交通大学学报, 2015, 49(10): 97-102.

YU Yangye, CAO Meng, ZHANG Haibo. A model of surface adsorption barrier on secondary electron spectrum of metal [J]. Journal of Xi'an Jiaotong University, 2015, 49(10): 97-102.

WAGNER H M, FERRIS W R. The orbital-beam secondary-electron multiplier for ultra-high-frequency amplification [J]. Proceedings of the IRE, 2006, 29(11): 598-602.

郝杰, 李维勤, 钱钧. 具有埋层结构电介质样品扫描电镜二次电子特性 [J]. 电子学报, 2015, 43(5): 1028-1034.

HAO Jie, LI Weiqin, QIAN Jun. Second electron characteristics of dielectrics with buried structures in SEM [J]. Acta Electronica Sinica, 2015, 43(5): 1028 -1034.

YU M. Power-handling capability for RF filters [J]. IEEE Microwave Magazine, 2007, 8(5): 88-97.

翁明, 王瑞, 崔万照. 采用等效特征扩散长度计算微波击穿电场 [J]. 西安交通大学学报, 2013, 47(4): 1-5.

WENG Ming, WANG Rui, CUI Wanzhao. Calculation of microwave breakdown electric field using the equivalent characteristic diffusion length [J]. Journal of Xi'an Jiaotong University, 2013, 47(4): 1-5.

宋庆庆, 王新波, 崔万照, 等. 多载波微放电中二次电子横向扩散的概率分析 [J]. 物理学报, 2014, 63(22): 31-37.

SONG Qingqing, WANG Xinbo, CUI Wanzhao, et al. Probability analysis of secondary electron transverse diffusion in multicarrier microdischarge [J]. Acta Physica Sinica, 2014, 63(22): 31-37.

LI Y, CUI W Z, WANG H G. Simulation investigation of multipactor in metal components for space application with an improved secondary emission model [J]. Physics of Plasmas, 2015, 22(5): 10.1063/1.4919858.

FURMAN M A, PIVI M T F. Probabilistic model for the simulation of secondary electron emission [J]. Physical Review Special Topics: Accelerators and Beams, 2002, 16(6): 124404.

BELHAJ M, TONDU T, INGUIMBERT V, et al. A Kelvin probe based method for measuring the electron emission yield of insulators and insulated conductors subjected to electron irradiation [J]. Journal of Physics: D Applied Physics, 2009, 42(10): 105309.

BELHAJ M, TONDU T, INGUIMBERT V. Effect of the incident electron fluence on the electron emission yield of polycrystalline Al2O3 [J]. Applied Surface Science, 2011, 257(10): 4593-4596.

BELHAJ M, TONDU T, INGUIMBERT V, et al. Electron emission yield and charging process of alkali-silicate glass submitted to an electron beam under the varying temperature condition [J]. Nuclear Instruments Methods in Physics Research, 2012, 270(1): 120-127.

WENG M, CAO M, ZHAO H J, et al. Note: a simple charge neutralization method for measuring the secondary electron yield of insulators [J]. Review of Scientific Instruments, 2014, 85(3): 036108.

CAO M, HU T C, WENG M, et al. Analytical model of dynamic secondary electron emission of insulators under electron irradiation [J]. Japanese Journal of Applied Physics, 2015, 54(9): 095701.

WENG M, HU T C, ZHANG N, et al. Dynamic secondary electron emission characteristics of polymers in negative charging process [J]. Modern Physics Letters: B, 2016, 30(11): 1650168.

SPACHMANN H, BECKER U. Electron gun simulation with CST PARTICLE STUDIO [J]. Nuclear Inst Methods in Physics Research: A, 2006, 558(1): 50-53.

杨景刚, 黎大健, 李军浩, 等. 气体绝缘开关直线和T型结构中电磁波传播特性的仿真 [J]. 西安交通大学学报, 2008, 42(12): 1526-1530.

YANG Jinggang, LI Dajian, LI Junhao, et al. Simulation for electromagnetic wave transmission characteristics in straight and T-shaped tanks of gas insulation switchgear structures [J]. Journal of Xi'an Jiaotong University, 2008, 42(12): 1526-1530.

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