A Restrictive Surface Structure for Suppressing Secondary Electron Emission

doi:10.7652/xjtuxb201704020

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A Restrictive Surface Structure for Suppressing Secondary Electron Emission

更新时间：2025-07-09

- A Restrictive Surface Structure for Suppressing Secondary Electron Emission
- Vol. 51, Issue 4, Pages: 128-134(2017)
- 作者机构：
  
  1. 中国空间技术研究院西安分院国家级空间微波技术重点实验室,西安,710000
  2. 西安交通大学电子物理与器件教育部重点实验室,西安,710049
- 作者简介：
- 基金信息：
- DOI：10.7652/xjtuxb201704020
  CLC： O462.2
- Online First：10 April 2017，
  
  Published：2017
- 稿件说明：
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A Restrictive Surface Structure for Suppressing Secondary Electron Emission[J]. 2017, 51(4): 128-134.
DOI：

A Restrictive Surface Structure for Suppressing Secondary Electron Emission[J]. 2017, 51(4): 128-134. DOI： 10.7652/xjtuxb201704020.

摘要

针对二次电子谐振倍增引起的微放电效应导致微波部件传输性能降低的现象

提出了一种能显著抑制二次电子的收拢式微陷阱表面结构。首先

通过分类处理弹性背散射、非弹性背散射以及真二次电子出射概率得到平整表面的总二次电子出射特性; 然后

采用粒子模拟的方法跟踪二次电子在收拢式陷阱结构内的级联再入射过程

获得收拢式陷阱结构对二次电子的抑制特性

从而得到收拢式表面结构对不同类型出射电子的抑制效果和二次电子能谱变化趋势

以及表面结构参数对二次电子发射特性和微放电品质因子的影响规律。仿真结果表明:收拢式表面使得二次电子产额在各个能量段整体下降

对应的二次电子能谱呈现更集中的趋势。收拢式结构中的矩形宽度对二次电子的影响呈先减小后增加趋势

而矩形深度能呈线性地提高微放电的品质因子。这种收拢式结构的椭圆水平轴长在最优的情况下比相同孔隙率和深宽比矩形陷阱结构对二次电子发射的抑制效果提高21.2%

同时使微放电品质因子提升24.97%。

Abstract

A restrictive calabash surface structure for the purpose of suppressing the emission of secondary electron and the effect of multipactor is proposed to improve the multipactor phenomenon in microwave devices. Simulation is performed to calculate secondary electron emission with the phenomenological probabilistic model

and to follow tracks of secondary electrons inside the groove with considering electrons multi-generation. Effects of the calabash surfaces on secondary electron yield(SEY)and secondary electron energy spectrum(SES)are simulated. Moreover

the SEY and the multipactor factor in different structures of the calabash surface are calculated. Simulation results show that increasing the half-width of upper calabash structure makes SEY have a trend of increase after first decrease

while the height of the upper calabash structure improves the multipactor factor linearly. In addition

when the half-width of the bottom calabash structure reaches its optimal value

the effects of the SEY suppression are 21.2% better than the effects of SEY of the rectangle structure surface

and the multipactor factor improves by 24.97%.

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references

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