Double Mask Projection Stereolithography Equipment

doi:10.7652/xjtuxb201702023

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Double Mask Projection Stereolithography Equipment

更新时间：2025-07-09

- Double Mask Projection Stereolithography Equipment
- Vol. 51, Issue 2, Pages: 149-154(2017)
- 作者机构：
  
  西安交通大学机械制造系统工程国家重点实验室,西安,710049
- 作者简介：
- 基金信息：
- DOI：10.7652/xjtuxb201702023
  CLC： TG665
- Online First：10 February 2017，
  
  Published：2017
- 稿件说明：
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Double Mask Projection Stereolithography Equipment[J]. 2017, 51(2): 149-154.
DOI：

Double Mask Projection Stereolithography Equipment[J]. 2017, 51(2): 149-154. DOI： 10.7652/xjtuxb201702023.

摘要

针对现有投影光固化成型系统的数字成像芯片尺寸有限、不能兼顾尺寸和精度的问题

研制了基于数字微反射镜成像的双投影光固化成型设备

通过两路不同成像倍率的光路拼接成型

提高了零件成型尺寸和精度。首先

提出了基于数字微反射镜的双投影光固化成型方案

研发了光学系统和机械结构。其次

进行了该系统4倍成像光路的光照强度均匀化测试、畸变校正测试、脱模方法测试和两个光路的单列条纹固化测试。最后

对双投影光固成型方法进行了实验验证

结果表明

该系统两个光路的单列像素固化特征平均宽度为55 μm和8 μm

并且采用双投影光固化成型方法可以同时满足成型尺寸和精度需求

还可进一步实现宏微结构一体化制造

用于微结构制造和生物制造的研究。

Abstract

The existing digital imaging chip used in mask projection stereolithography system cannot balance the requirements for part size and precision

so a novel stereolithography method based on DMD with two mask projection systems is proposed in this study and the corresponding equipment is constructed. According to DMD digital imaging chip

a scheme of double mask projection sterolithography system is suggested

and the optical system and the machine structure are designed. The uniformity of illumination intensity of 4X image

the distortion correction of 4X image

the demolding program and the curing parts of single row pixel projection of 4X lens and 0.5X lens are measured and tested. The double mask projection sterolithography method is experimentally verified for the process feasibility. The results demonstrate that the average widths of cured parts of the single row pixel of two projection images reach 55 μm and 8 μm

and the proposed method can balance the requirements for both size and precision in macro/micro structure manufacturing.

关键词

Keywords

references

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TAN Dongcai, XU Guangshen, LUO Sheng, et al. Research on illumination measuring system for mask projection stereolithography [J]. Electro-Optic Technology Application, 2010, 25(3): 53-56.

杨根, 马训鸣, 胥光申, 等. 面曝光快速成形系统中图像的畸变校正 [J]. 西安工程大学学报, 2011, 25(5): 712-716.

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TUMBLESTON J R, SHIVANYANTS D, ERMOSHIKIN N, et al. Continuous liquid interface [J]. Science, 2015, 347(6228): 1349-1352.

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