A novel GaAs-based tunnel field-effect transistor without drain junction is proposed to improve the on-state current and its performance is investigated. The transistor uses N-type InGaAs with the same doping concentration in the channel and drain to form junctionless channel/drain and to simplify the manufacture process
while P-type GaAsSb is used in the source to produce hetero junction source/channel and to increase the on-state current. The widened tunnel barrier in the off-state decreases the leakage current
and the promoted band-to-band tunneling probability in the on-state increases the driving current
so that both the low subthreshold slope and the high ratio between on-state current and off-state current are obtained. Numerical simulations show that the nov
el device achieves an on-state current of 3.66×10
-3
A
and an off-state current of 4.35×10
-13
A under 0.4 V voltage
and the ratio between on-state current and off-state current is 10
10
and that an average subthreshold slope of 27 mV/dec and a DIBL of 126 are obtained.
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references
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