A controllable preparation method for synthesizing hundreds of micro-sized single-crystal grapheme is proposed by regulating the process of chemical vapor deposition. Nucleation density and morphology of graphene is controlled by annealing time and temperature in Ar atmosphere. Fractal structure of grapheme is improved by using substrate pretreatment by FeCl
3
and controlling ratio of H
2
and CH
4
flows
and the size of graphene is increased by extending growth time. Experimental results show that the proposed method could control the graphene with different structure such as quadrilaterals
hexagons
and stacks. Quadrilateral graphene could be controlled from fractal structure wi
th narrow
swallow wings
or butterfly to non-fractal structure in square. The size of hexagon graphene can be increased from dozens of micron to more than 200 microns
and stacked graphene is obtained. It is expected that graphene with single atomic layer structure and high charge carrier mobility will solve the integrated circuits problem for hundred micron scale single crystal graphene with consistent lattice orientations.
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references
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