A partially-depleted dual-material surrounding-gate metal-oxide-semiconductor field-effect-transistor(MOSFET)structure(DMSG)is proposed to suppress the short channel effect and to increase the current drivability. Two-dimensional analytical models for both surface potential and threshold voltage are respectively presented for the novel structure. The dual-material surrounding gate consists of two metals connecting tightly with different work functions
and it can produce the electric field peak near the source in the channel
decrease the electric field near the drain
and mask the influence of the drain voltage on the minimum surface potential. The potential Poisson equations in the two depleted divisions are given with the boundary conditions in the cylindrical coordinate system. The analytical models are derived based on the solution of the partial differential equations through reducing the dimensions with parabolic potential approximation in the direction vertical to the channel. Numerical simulation and comparisons with the traditional partially depleted device show that the DMSG device increases the carrier transport efficiency
and suppresses the short channel effect
drain-induced barrier lowering effect and hot carrier effect
and that the relative error between the derived analytical model and the numerical simulation software is less than 5%.
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