Resist Filling Behavior in Microimprint

doi:10.7652/xjtuxb201309021

您当前的位置：

首页 >

文章列表页 >

Resist Filling Behavior in Microimprint

更新时间：2025-07-09

- Resist Filling Behavior in Microimprint
- Vol. 47, Issue 9, Pages: 126-133(2013)
- 作者机构：
  
  西安交通大学机械制造系统国家重点实验室,西安,710049
- 作者简介：
- 基金信息：
- DOI：10.7652/xjtuxb201309021
  CLC： TB22
- Online First：10 September 2013，
  
  Published：2013
- 稿件说明：
移动端阅览
Resist Filling Behavior in Microimprint[J]. 2013, 47(9): 126-133.
DOI：

Resist Filling Behavior in Microimprint[J]. 2013, 47(9): 126-133. DOI： 10.7652/xjtuxb201309021.

摘要

为了提高微压印的质量

改进工艺参数优化模具结构

对微压印抗蚀剂的填充行为进行了数值计算和可视化实验研究。实验在三维离焦数字粒子图像测速系统中进行

由此提取了抗蚀剂中的荧光示踪粒子的坐标

通过时间解析算法获得了示踪粒子的三维粒子场

利用粒子跟踪测试技术获得了示踪粒子的速度场。数值模拟中采用了计算流体动力学软件

同时考虑了表面张力和接触角等因素

并根据模具特征划分了不同的压印区域

以分析、预测压印模型中的抗蚀剂填充行为。研究结果显示: 数值模拟与实验结果吻合较好

抗蚀剂速度最大值在模具尖角与支撑基板之间

抗蚀剂速度水平方向上的实验最大误差为6.6%

竖直方向上的最大误差为9.6%; 模具侧壁下方粒子运动轨迹的演化方向决定着抗蚀剂的体积转移方向和最终的填充形貌。该结果可为深入研究微压印中抗蚀剂流动提供参考。

Abstract

In order to improve microimprint quality and process parameters

and to optimize module structure

numerical simulations and visualization experiments were conducted to study the resist filling behavior of microimprint lithography. A 3D defocusing digital particle image velocimetry system was established to do visualization research and the spatial coordinates of the fluorescent tracer particles in the resist were extracted from images. The 3D particle field inside the resist was obtained by the time-resolved algorithm. The velocity field was derived from the particle spatial position using particle tracking velocimetry. A numerical model based on the computational fluid dynamics was built to examine the resist filling behavior with surface tension and contact angle considered. The stamping area was divided into different parts according to the mold features. The numerical simulation results agree well with the experimental data. The results show that the experimental error of the resist velocity fields in the horizontal direction is less than 6.6%

while the experimental error in the vertical direction is less than 9.6%. The maximum velocity of the resist always lies in the sector between the stamp corner and the substrate. The evolution directions of motion trajectories of particles under the stamp sidewall determine the filling morphology and the direction of transferred volume of the resist. The results of this study may provide references to the further research on the resist flow in microimprint.

关键词

Keywords

references

CHOU S Y, KRAUSS P R, RENSTROM P J. Nanoimprint lithography [J]. Vac Sci Technol: B, 1996, 14(6): 4129.

BENDER M, FUCHS A, PLACHETKA U, et al. Status and prospects of UV-nanoimprint technology [J]. Microelectron Eng, 2006, 83(4/5/6/7/8/9): 827-830.

HIROSHIMA H, KOMURO M. Control of bubble defects in UV nanoimprint [J]. Jpn J Appl Phys: Part 1 Regul Pap Brief Commun Rev Pap, 2007, 46(9B): 6391-6394.

NAGAOKA Y, MORIHARA D, HIROSHIMA H, et al. Simulation study on bubble trapping in UV nanoimprint lithography [J]. Photopolym Sci Technol, 2009, 22(2): 171-174.

MERINO S, RETOLAZA A, SCHIFT H, et al. Stamp deformation and its influence on residual layer homogeneity in thermal nanoimprint lithography [J]. Microelectron Eng, 2008, 85(5/6): 877-880.

YONEDA I, NAKAGAWA Y, MIKAMI S, et al. A study of filling process for UV nanoimprint lithography using a fluid simulation [J]. Proc SPIE, 2009, 7271: 1-7.

YASUDA M, ARAKI K, TAGA A, et al. Computational study on polymer filling process in nanoimprint lithography [J]. Microelectron Eng, 2011, 88(8): 2188-2191.

WOO Y, LEE D, LEE W. Molecular dynamic studies on deformation of polymer resist during thermal nano imprint lithographic process [J]. Tribol Lett, 2009, 36(3): 209-222.

KIM K D, KWON H J, CHOI D G, et al. Resist flow behavior in ultraviolet nanoimprint lithography as a function of contact angle with stamp and substrate [J]. Jpn J Appl Phys, 2008, 47(11): 8648-8651.

KIM N W, KIM K W, SIN H C. A mathematical model for slip phenomenon in a microcavity-filling process of nanoimprint lithography [J]. Microelectron Eng, 2009, 86(11): 2324-2329.

YOUNG W B. Analysis of the nanoimprint lithography with a viscous model [J]. Microelectron Eng, 2005, 77(3/4): 405-411.

YU Z N, GAO H, CHOU S Y. RIMS(real-time imprint monitoring by scattering of light)study of pressure, temperature and resist effects on nanoimprint lithography [J]. Nanotechnology, 2007, 18(6): 1-4.

HOCHENG H, NIEN C C. In-situ monitoring of microcavity filling in nanoimprints by capacitance [J]. Jpn J Appl Phys: Part 1 Regul Pap Brief Commun Rev Pap, 2006, 45(6B): 5590-5596.

YU Z N, GAO H, CHOU S Y. In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry [J]. Appl Phys Lett, 2004, 85(18): 4166-4168.

LINDKEN R, GRO M R, WESTERWEEL J. Micro-particle image velocimetry([small micro]PIV): recent developments, applications, and guidelines [J]. Lab Chip, 2009, 9: 2551-2567.

BOWN M R, MACINNES J M, ALLEN R W K, et al. Three-dimensional, three-component velocity measurements using stereoscopic micro-PIV and PTV [J]. Meas Sci Technol, 2006, 17(8): 2175-2185.

MENG H, PAN G, PU Y, et al. Holographic particle image velocimetry: from film to digital recording [J]. Meas Sci Technol, 2004, 15(4): 673-685.

SHENG J, MALKIEL E, KATZ J. Using digital holographic microscopy for simultaneous measurements of 3D near wall velocity and wall shear stress in a turbulent boundary layer [J]. Exp Fluids, 2008, 45(6): 1023-1035.

WILLERT C E, GHARIB M. 3-dimensional particle imaging with a single camera [J]. Exp Fluids, 1992, 12(6): 353-358.

GROTHE R L, DABIRI D. An improved three-dimensional characterization of defocusing digital particle image velocimetry(DDPIV)based on a new imaging volume definition [J]. Meas Sci Technol, 2008, 19(6): 1-13.

KAJITANI L, DABIRI D. A full three-dimensional characterization of defocusing digital particle image velocimetry [J]. Meas Sci Technol, 2005, 16(3): 790-804.

LU J, PEREIRA F, FRASER S E, et al. Three-dimensional real-time imaging of cardiac cell motions in living embryos [J]. Journal of Biomedical Optics, 2008, 13(1): 1-8.

PEREIRA F, GHARIB M. Defocusing digital particle image velocimetry and the three-dimensional characterization of two-phase flows [J]. Meas Sci Technol, 2002, 13(5): 683-694.

PEREIRA F, LU J, CASTANO-GRAFF E, et al. Microscale 3D flow mapping with mu DDPIV [J]. Exp Fluids, 2007, 42(4): 589-599.

GONZALEZ R, WOODS R. Digital image processing [M]. Boston, USA: Addison-Wesley Longman Publishing Co. Inc., 2001.

JEONG J H, CHOI Y S. Flow behavior at the embossing stage of nanoimprint lithography [J]. Fibers and Polymers, 2002, 3(3): 113-119.

CHAN D Y C, HORN R G. The drainage of thin liquid films between solid surfaces [J]. J Chem Phys, 1985, 83(10): 5311-5324.

Views

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

Study of the Mechanism of Electrostatic Accumulation and Current Density Distribution Characteristics During Liquid Hydrogen Pipeline Transportation

Numerical Simulation of Space Charge Distribution Characteristics of Polyimide Materials under X-Ray Irradiation

Numerical Simulation Study on Geothermal Extraction Characteristics of Supercritical CO2 in Heterogeneous Fractures

Action Mechanism of Heat Transfer between the Working Medium and the Impeller on Aerodynamic Performance and Flow Characteristics of Radial Inflow Turbines with Supercritical Carbon Dioxide

Analysis of the Attached Vortex Model for the Flow Characteristics of Wing Near-Field Wakes

Related Author

SUN Wenhao

LIU Hongbao

WANG Lei

QING Ziyou

LI Zhuolun

MA Yuan

LI Yanzhong

ZHONG Hui

Related Institution

School of Energy and Power Engineering，Xi’an Jiaotong University

Aerospace System Engineering Shanghai

School of Electrical Engineering，Xi’an Jiaotong University

Northwest Institute of Nuclear Technology

Institute of Electronic Engineering，China Academy of Engineering Physics

⁰