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Magnetic Field in Working Region of Rectangular Planar DC Magnetron Sputtering Apparatus
更新时间:2025-12-08
    • Magnetic Field in Working Region of Rectangular Planar DC Magnetron Sputtering Apparatus

    • Vol. 41, Issue 12, Pages: 1441-1445(2007)
    • CLC: TN305
    • Online First:10 December 2007

      Published:2007

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  • 邱清泉 1, 励庆孚 1, Yu Jiao 2, et al. Magnetic Field in Working Region of Rectangular Planar DC Magnetron Sputtering Apparatus[J]. 2007, 41(12): 1441-1445. DOI:

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