Magnetic Field in Working Region of Rectangular Planar DC Magnetron Sputtering Apparatus
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Magnetic Field in Working Region of Rectangular Planar DC Magnetron Sputtering Apparatus
Vol. 41, Issue 12, Pages: 1441-1445(2007)
作者机构:
西安交通大学电气工程学院,西安,710049
作者简介:
基金信息:
DOI:
CLC:TN305
Online First:10 December 2007,
Published:2007
稿件说明:
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邱清泉 1, 励庆孚 1, Yu Jiao 2, et al. Magnetic Field in Working Region of Rectangular Planar DC Magnetron Sputtering Apparatus[J]. 2007, 41(12): 1441-1445.
DOI:
邱清泉 1, 励庆孚 1, Yu Jiao 2, et al. Magnetic Field in Working Region of Rectangular Planar DC Magnetron Sputtering Apparatus[J]. 2007, 41(12): 1441-1445.DOI:
Magnetic Field in Working Region of Rectangular Planar DC Magnetron Sputtering Apparatus
Analyzing the influence of the magnetic field on magnetron sputtering process
the principles of the magnetic field design for the working region of the rectangular planar DC magnetron sputtering apparatus are summarized
and two feasible magnet configurations are proposed. The magnetic field distribution of one apparatus is evaluated by finite element method to well coincide with the measurements. Simultaneously
the influence of the magnetic field distribution on the target erosion is investigated
and detailed measures for improving the magnetic field are proposed. The magnetic field is improved by shimming method with the shunt bar
and the horizontal magnetic field component with saddle distribution enables to enhance the target utilization. The inclined pole shoe has little benefit to the magnetic field. In addition
staggering the joint gap between the magnets and precisely magnetizing the permanent magnet facilitate enhancing the uniformity of the magnetic field in the working region.
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references
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