Automated Generation of Mask and Process Flow for Surface Micromachined Devices

张长富 1; 2; 任泰安 1; 卢德江 1; 蒋庄德 1

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Automated Generation of Mask and Process Flow for Surface Micromachined Devices

更新时间：2025-12-08

- Automated Generation of Mask and Process Flow for Surface Micromachined Devices
- Vol. 41, Issue 9, Pages: 1031-1035(2007)
- 作者机构：
  
  1. 西安交通大学机械制造系统工程国家重点实验室,西安,710049
  2. 西安工业大学机电工程学院,西安,710032
- 作者简介：
- 基金信息：
- DOI：
  CLC： TH39;TP391.7
- Online First：10 September 2007，
  
  Published：2007
- 稿件说明：
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张长富 1, 2, 任泰安 1, et al. Automated Generation of Mask and Process Flow for Surface Micromachined Devices[J]. 2007, 41(9): 1031-1035.
DOI：

张长富 1, 2, 任泰安 1, et al. Automated Generation of Mask and Process Flow for Surface Micromachined Devices[J]. 2007, 41(9): 1031-1035. DOI：

摘要

为消除目前手工设计掩膜和工艺流程的繁琐过程

提出了一种从表面硅微器件的三维结构模型自动生成掩膜和工艺流程的方法.该方法将三维器件模型作为输入

根据其组成特征的几何信息和材料信息识别出基底层、结构层、牺牲层和金属层等所有工艺层

再根据工艺层的结构特点和材料信息自动生成掩膜和工艺流程

并利用SolidWorks软件用户接口开发的应用程序验证了方法的可行性.应用实例表明

该方法不仅可以使设计者专注于器件结构本身的设计

而且易于实现掩膜和工艺流程的自动化生成

比传统的手工设计方法更加直观、高效

为相应的设计工具开发提供了理论分析和实验验证.

Abstract

To get rid of the abstract and tedious design of the current methodology

a new generation method of mask and process flow for surface micromachined devices is proposed

where the constructed 3D geometric models are employed to recognize and generate basic process layers

such as silicon substrate layers

structural layers

sacrificial layers and metal layers

by analyzing the 3D component features and material information. The mask and process flow are automatically generated from the basic layers according to the geometric characteristics and material information

and a program is developed through the application programming interfaces of SolidWorks to verify the method. A practical example shows that this method is effective and straightforward to obtain mask and process flow from the constructed geometric models of surface micromachined devices.

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references

Antonsson K E. Structured design methods for MEMS [C]∥Structured Design Methods for MEMS Final Report. Pasadena, USA: California Institute of Technology, 1996: 53-57.

Venkataraman V, Sarma R, Ananthasuresh G K. Part-to-art: basis for a systematic geometric design tool for surface micromachined MEMS [C]∥Proceedings of the ASME Design Engineering Technical Conferences. Baltimore, USA: ASME, 2000: 11-14.

Schiek L R, Schmidt C R. Automated surface micromachining mask creation from a 3D model [J]. Microsystem Technologies, 2006, 12(3):204-207.

Ma Lin, Antonsson K E. Robust mask-layout synthesis for MEMS[C]∥Proceedings of the 4th International Conference on Modeling and Simulation of Microsystems. Hilton Head, USA: ACRS, 2001: 128-131.

李卫民,刘淑芬.基于SolidWorks平台的二次开发技术[J].机械制造,2003,41(3): 24-26.

Li Weimin, Liu Shufen. Secondary development based on SolidWorks platform [J]. Machinery, 2003, 41(3): 24-26.

Zhang Changfu, Jiang Zhuangde, Lu Dejiang, et al. 3D MEMS design method via SolidWorks [C]∥Proceedings of the 1st IEEE International Conference on Nano/Micro Engineered and Molecular Systems. Orlando, USA: IEEE, 2006: 747-751.

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