Molecular Simulation for Migration Characteristics of Kink-Reconstruction Defect Complex on 30° Partial Dislocation in Silicon
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Molecular Simulation for Migration Characteristics of Kink-Reconstruction Defect Complex on 30° Partial Dislocation in Silicon
Vol. 43, Issue 5, Pages: 124-127+132(2009)
作者机构:
哈尔滨工业大学航天科学与力学系,哈尔滨,150001
作者简介:
基金信息:
DOI:
CLC:O474;O411.3
Online First:10 May 2009,
Published:2009
稿件说明:
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Molecular Simulation for Migration Characteristics of Kink-Reconstruction Defect Complex on 30° Partial Dislocation in Silicon[J]. 2009, 43(5): 124-127+132.
DOI:
Molecular Simulation for Migration Characteristics of Kink-Reconstruction Defect Complex on 30° Partial Dislocation in Silicon[J]. 2009, 43(5): 124-127+132.DOI:
Molecular Simulation for Migration Characteristics of Kink-Reconstruction Defect Complex on 30° Partial Dislocation in Silicon
The migration processes of left kink-reconstruction defect complex(LC)and right kink-reconstruction defect complex(RC)in one period are obtained by using the molecular dynamics method based on the environment-dependent interatomic potential(EDIP). The migrations proceed through the transformation among the steady states in the period. And the velocity characteristics of LC and RC are investigated under different temperature and shear stress conditions. The migration energies of LC and RC in one migration period are calculated by performing the nudged elastic band(NEB)calculations with the tight binding(TB)potential. These energy data coincide well with the dynamics results. It is known that LC and RC containing the reconstruction defect(RD)move faster than the left kink(LK)and right kink(RK)
which validates our previous conclusion that RD can promote the motion of the 30° partial dislocation. Moreover
this conclusion is explained at the atomic level by the observation of microstructures during the motion.
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references
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