Identification and Simulation of Template Spatial Position in Nanoimprint Lithography Process

蒋维涛; 丁玉成; 卢秉恒; 刘红忠

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Identification and Simulation of Template Spatial Position in Nanoimprint Lithography Process

更新时间：2025-12-08

- Identification and Simulation of Template Spatial Position in Nanoimprint Lithography Process
- Vol. 41, Issue 1, Pages: 55-58(2007)
- 作者机构：
  
  西安交通大学机械制造系统工程国家重点实验室,西安,710049
- 作者简介：
- 基金信息：
- DOI：
  CLC： TH112;TH113.1
- Online First：10 January 2007，
  
  Published：2007
- 稿件说明：
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蒋维涛, 丁玉成, 卢秉恒, et al. Identification and Simulation of Template Spatial Position in Nanoimprint Lithography Process[J]. 2007, 41(1): 55-58.
DOI：

蒋维涛, 丁玉成, 卢秉恒, et al. Identification and Simulation of Template Spatial Position in Nanoimprint Lithography Process[J]. 2007, 41(1): 55-58. DOI：

摘要

在纳米压印光刻中

为了减小模具与晶片的平行度误差

将精对正光栅标记的相对误差校正到半栅距范围之内

并建立了点光源映射的数学模型

对模具空间位姿的投影进行图像识别.在算法设计的基础上

建立了纳米压印光刻系统中的粗对正系统及其控制流程

通过仿真计算

可以将模型的转角计算精度控制在10

-6

rad以下

位置偏移量计算精度控制在1 nm以下

所建立的粗对正系统的检测精度可达到1 μm以下

因此满足了压印光刻中下一步精对正系统的要求.

Abstract

In nanoimprint lithography

to reduce the error of parallelism between the template and the substrate

and adjust the relative error between the grating marks for precise alignment to half of the grating distance

a mathematic model for spot lamp-house mapping is established to identify the image of the template projection. Based on the algorithm

a coarse-alignment system and the corresponding control process are designed. Via the simulation

the calculating accuracy for the rotate angle can be controlled below 10

-6

rad

for offset below 1 nm. Thus the precision of the coarse-alignment system gets below 1 μm to meet the requirement of the next precise alignment.

关键词

Keywords

references

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刘红忠,卢秉恒,丁玉成,等.超高精度定位系统及线性补偿研究[J].西安交通大学学报,2003,37(3):277-280.

Liu Hongzhong, Lu Bingheng, Ding Yucheng, et al. Study of ultra precision positioning system and linearity compensation [J]. Journal of Xi'an Jiaotong University, 2003, 37(3):277-280.

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Liu Hongzhong, Ding Yucheng, Li Dicheng, et al. Submicro-positioning system based on multi-dimensional ultraprecise micro actuators [J]. Information and Control, 2002,31(5):446-450.

刘红忠,丁玉成, 卢秉恒,等. 压印工作台的纳米级自找准定位研究[J]. 西安交通大学学报,2003,37(5): 467-470.

Liu Hongzhong, Ding Yucheng, Lu Bingheng, et al. Research on self-alignment and positioning for imprint stage in nanometer scale [J]. Journal of Xi'an Jiaotong University, 2003,37(5):467-470.

Pahk H J, Lee D S, Park J H. Ultra precision positioning system for servo motor-piezo actuator using the dual servo loop and digital filter implementation [J]. Machine Tools and Manufacture, 2001, 41(1): 51-63.

Park S R, Yang S H. A mathematical approach for analyzing ultra precision positioning system with compliant mechanism [J]. Materials Processing Tech, 2005,164-165: 1584-1589.

Rao G S, Ro P I. Submicrometer control of a traction drive using state feedback and estimation [J]. Precision Engineering, 1995, 17(2):124-130.

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