The focusing and deflecting system is formed by heterogeneous magnetic field structure
which improves the focusing and deflecting characters of e-type electrons. The electron trajectory in the deflection system of electron gun is calculated by using the boundary element method and the Runge-Kutta method. Then the focusing and deflection characteristics of electron gun are studied. The good characteristics of the deflection system of electron gun can be obtained by optimizing the velocity and the location of emitting electron beam and by the aclinic emission of the electron beam
that can be achieved by making the end of the anode and the middle part of the cathode level. A new type of deflection system of electron gun is designed
and results with the new system show that non-uniform magneric field makes the beam of e-type eletron gun focus well
and the electronic beam diameter is less 3 mm when the emitting current is 50 to 100 mA.
关键词
Keywords
references
REBHOLZ C, MONCLUS M A, BAKER M A, et al. Hard and superhard TiAlBN coatings deposited by twin electron-beam evaporation [J]. Surf Coat Technol, 2007, 201(13): 6078-6082
HSU S W, YANG T S, CHEN T K, et al. Ion-assisted electron-beam evaporation of carbon-doped titanium oxide films as visible-light photocatalyst [J].Thin Solid Films, 2007, 515(7): 3521-3526.
WEI Ronghua, BOOKER T, RINCON C, et al. Metal plasma immersion ion implantation and deposition(MPIII and D)using a metal plasma electron evaporation source(MPEES)[J].Surf Coat Technol, 2005, 199(2): 579-583.
SUBRAHMANYAM A, BARIK U K. Synthesis of P-type transparent conducting silver: indium oxide(AIO)thin films by reactive electron beam evaporation technique [J].Journal of Physics and Chemistry of Solids, 2005, 66(5): 817-822.
赵玉清.电子束离子束技术[M].西安:西安交通大学出版社,2002.
孔庆生.四坩埚磁偏转电子束蒸发源[J]. 真空科学与技术, 1981, 1(2): 86-94.
KUNG Chingsheng. Evaporator with magnetic reflection electron beam using four crucibles[J]. Chinese Journal of Vacuum Science and Technology, 1981, 1(2): 86-94.
DENG Lifen, XIONG Yuansheng, XIAO Ping.Modelling and experimental study of impedance spectra of electron beam physical vapour deposition thermal barrier coatings [J]. Surf Coat Technol, 2007, 201(18): 7755-7763.
VAN VEENHUIZEN M J, MOODERA J. Electron deflector in UHV system: scattered electrons in e-beam evaporation [J/OL].Rev Sci Instrum, 2008, 79(3)[2008-10-11].http:∥link.aip.org/?RSINAK/791/033907/1.
IQBAL M, ALEEM F. Design and performance of high uniformity linear filament electron gun [J/OL].Rev Sci Instrum, 2006, 77(10)[2008-10-11].http:∥link.aip.org/?RSINAK/77/106101/1.