Fabrication and Characterization of Controlled Microstructure Photo-Anode for TiO<sub>2</sub> Thin Film by Nano Imprint Lithography

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Fabrication and Characterization of Controlled Microstructure Photo-Anode for TiO₂ Thin Film by Nano Imprint Lithography

更新时间：2025-07-09

- Fabrication and Characterization of Controlled Microstructure Photo-Anode for TiO₂ Thin Film by Nano Imprint Lithography
- Vol. 43, Issue 11, Pages: 90-94(2009)
- 作者机构：
  
  西安交通大学机械制造系统工程国家重点实验室,西安,710049
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN305.7
- Online First：10 November 2009，
  
  Published：2009
- 稿件说明：
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Fabrication and Characterization of Controlled Microstructure Photo-Anode for TiO₂ Thin Film by Nano Imprint Lithography[J]. 2009, 43(11): 90-94.
DOI：

Fabrication and Characterization of Controlled Microstructure Photo-Anode for TiO₂ Thin Film by Nano Imprint Lithography[J]. 2009, 43(11): 90-94. DOI：

摘要

提出一种以常温紫外固化纳米压印技术实现定制化微结构TiO

纳米晶岛薄膜制备的工艺

用于制备垂直于透明导电基底的TiO

薄膜光阳极.混合TiO

粉体、分散剂、乳化剂、酒精和光固化树脂等

制备可紫外光固化的TiO

溶胶

并经步进压印形成宽度为3 μm的具有离散纳米晶岛微结构的薄膜

经保压复型优化压印工艺后处理

保证了离散纳米晶岛微结构的高保真度.经600 ℃烧结去除薄膜中的掺杂物

退火至450 ℃后获得了定制化微特征的锐钛矿型TiO

半导体薄膜.在N719染料敏化条件下

制备出了定制化微结构光阳极的染料敏化太阳能电池.AM1.5(0.1 W/cm

)光照条件下的测试实验结果表明

该电池的光电转化效率可达2.7%.此工艺有望应用于制备高稳定性固态或准固态电解质染料敏化太阳能电池.

Abstract

A UV-based nano imprint lithography(NIL)method is developed to fabricate thin film with controlled TiO

nanocrystal island array on the transparent conductive glass substrate for dye sensitive solar cells(DSSC). The UV curable TiO

sol is prepared to form TiO

thin film with 3 μm critical dimension TiO

nanocrystal island array by mixing TiO

powder

dispersant

emulsifier

alcohol and UV-curable resin. Ultimately

TiO

thin film with orderly island array is fabricated by the pressure holding replica optimized technique. The thin film is further heated up to 600 ℃ to wipe off the adulterant like UV-curable resist and cooled down to 450 ℃

then the TiO

nanocrystal island on the thin film is changed to the anatase TiO

. The experimental results show that DSSC equipped with TiO

nanocrystal island array is endowed with conversion efficiency over 2.7% under AM 1.5 illumination(0.1 W/cm

)

which infers that the NIL method can be employed to fabricate highly stable DSSC with quasi-solid-state or solid state electrolyte.

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references

O'REGAN B, GRATZEL M. Theoretical modeling of TiO2/TCO interfacial effect on dye-sensitized solar cell performance [J]. Solar Energy Materials Solar Cells, 2006, 90(13): 2000-2009.

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Fabrication and Characterization of Controlled Microstructure Photo-Anode for TiO2 Thin Film by Nano Imprint Lithography

DOI：

摘要

Abstract

关键词

Keywords

references

Fabrication and Characterization of Controlled Microstructure Photo-Anode for TiO₂ Thin Film by Nano Imprint Lithography