Polycrystalline Ga-doped ZnO(Ga:ZnO)thin films are deposited on quartz glass substrates at room temperature by using radio frequency magnetron sputtering. The correlation between the growth conditions and Ga:ZnO film properties is studied through modulation of sputtering power density and target-to-substrate distance. It is found that the conductivity of Ga:ZnO films increases with increasing of power density and decreasing of target-to-substrate distance. The lowest conductivity of Ga:ZnO films is 3.1×10
-4
Ω·cm grown when the power density is 5.3 W/cm
2
and the target-to-substrate distance is 5 cm. The red shift in the optical UV absorption of Ga:ZnO films grown under high power density occurs
and results in the absorption effect through Urbach-tail states with increasi
ng the doping defect density in the Ga:ZnO thin films. The average transmittance of Ga:ZnO films is above 80% in the visible spectrum range.
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references
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