Yuanjie Li,Zilong Liu,Kai Jiang,Xiaofen Hu.H 2 annealing effect on the structural and electrical properties of amorphous InGaZnO films for thin film transistors[J].Journal of Non-Crystalline Solids,2013.
E. Fortunato,P. Barquinha,R. Martins.Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances[J].Adv. Mater.,2012(22).
Yuanjie Li,Xiaofen Hu,Zilong Liu,Jiangbo Ren.Power and gas pressure effects on properties of amorphous In–Ga–ZnO films by magnetron sputtering[J].Journal of Materials Science: Materials in Electronics,2012.
Hai Q. Chiang,Brian R. McFarlane,David Hong,Rick E. Presley,John F. Wager.Processing effects on the stability of amorphous indium gallium zinc oxide thin-film transistors[J].Journal of Non-Crystalline Solids,2008(19).
P. Barquinha,A. Pimentel,A. Marques,L. Pereira,R. Martins,E. Fortunato.Influence of the semiconductor thickness on the electrical properties of transparent TFTs based on indium zinc oxide[J].Journal of Non-Crystalline Solids,2006(9).